Investigation and characterization of ph effect on tio2 thin film surface

Abstract

TiO2 İNCE FİLM YÜZEYİNE PH FAKTÖRÜNÜN ETKİSİNİNARAŞTIRLMASI VE KARAKTERİZASYONUÖZBu çalışmada TiO2 esaslı farklı pH değerine sahip çözeltiler hazırlanmış ve cam altlıküzerine kaplaması yapılmıştır. Kaplanan çözeltiler ısıl işleme tabii tutularak ince filmoluşumu gerçekleştirilmiştir. Amaç pH etkisinin film yüzey alanına etkisiniaraştırmak ortalama pürüzlülük değerlerini hesaplamaktır. Bu amaçla sol geldaldırma kaplama yöntemi ile kaplaması yapılan numuneler aynı sıcaklık vesürelerde ısıl işleme tabii tutulmuştur. Alınan sonuçlara göre artan pH ile dahapürüzlü bir film yüzeyi elde edilmesine sebep olmuştur.Anahtar kelimeler: TiO2, İnce Film, pH, yüzey alanı, yüzey pürüzlülüğü.

INVESTIGATION AND CHARACTERIZATION OF PH EFFECT ON TiO2 THIN FILM SURFACEABSTRACTThin film solar technology is used various devices that convert the sun light intoelectrical energy. These applications have been crucial for human life since theysupply us clean and alternative energy sources. For this application manycomponents can be used Cu2S, CdTe, CIGS, CNTS, and TiO2 etc. TiO2 is one ofthem and preferable for this technology because of its good electrical and physicalproperties.TiO2 based solutions prepared completely transparent are coated on ITO glass withdifferent Ph values, sol gel dip coating method. This coated glass annealed with sametemperature and same holding time.Previous research shows that pH factor has significant effect on the surfacemorphology of films. Surface area and surface roughness are pH dependentparameters that very important for light conversion efficiency.In this study, the effect of pH on thin film surface morphology is investigated. 4different Ph values sols are coated on ITO glass. These glasses annealed in thefurnace with same temperatures and same holding time. The results are determinedwith several methods. Chemical properties determine by X-ray photoelectronscanning (XPS), X ray diffraction scanning (XRD) surface properties and roughnessvalues investigated by atomic force microscopy (AFM), and ellipsometry. The XPSand XRD results show that, because of the low working temperatures there is not anychange in chemical structure of TiO2. The material that we study is glass. Above600°C chemical structure of glass can be deteriorated. We carried out our experimentbelow this temperature.Keywords: TiO2, Thin Film, pH, surface area, surface roughness.